MgO Wafer (Magnesium Oxide Substrate)

High-quality MgO wafers for superconducting, epitaxial, and thin-film applications.

 

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Description

🔷 Overview

Magnesium Oxide (MgO) wafers are single-crystal substrates widely used in thin-film deposition, superconducting devices, and oxide electronics.

MgO features a wide bandgap (~7.8 eV) and excellent insulating properties, making it an ideal dielectric substrate for electronic and optical applications.

Its cubic crystal structure (rock-salt) provides excellent lattice matching with a wide range of oxide and nitride materials, enabling high-quality epitaxial growth.

In addition, MgO offers high thermal stability, chemical resistance, and low dielectric loss, making it especially suitable for high-temperature superconducting films, microwave devices, and advanced research applications.

 

🔷 Key Features

  • Wide bandgap (~7.8 eV) for insulating applications
  • Excellent lattice matching for oxide thin films
  • High thermal stability and high melting point (~2800°C)
  • Low dielectric loss for microwave/RF devices
  • High optical transparency (UV–IR range)
  • Good chemical stability and corrosion resistance
  • Suitable for high-temperature and harsh environments

 

🔷 Specifications

Product:

Single crystal MgO wafer

Purity:

> 99.99%

Material property:

Crystal structure:             cubic

Lattice constant:              a = 4.216 Å

Density:                             3.98 g/cm3

Melting point:                  2800 °C

Hardness:                          5.5 mohs

Coefficient of Thermal expansion: 11.2 x 10-6 / ℃

Thermal Conductivity:   0.14 @300K ( cal/cm sec degree )

Dielectric Constant:     ~ 9.8 @300K 

Optical transmission: > 90% (200-400 nm), > 98% (500 – 1000 nm)

Growth method:             Special Arc Melting

Dimension:

• 5 × 5 mm

• 5 × 10 mm

• 10 × 10 mm

• 20 × 20 mm

• φ1″ x 0.5mm
• φ2″ x 0.5mm
• Other sizes customizable

Thickness:

• 0.1 mm

• 0.5 mm

• 1.0 mm

• 2.0 mm

• Other sizes customizable

Orientation:

• <100> ± 0.5°

• <110> ± 0.5°

• <111> ± 0.5°

• other off-angle

Polishing:

• Fine ground

• Single side epi-polished

• double side epi-polished

Surface roughness:

< 0.5 nm

 

🔷 Applications

  • High-temperature superconducting thin films (HTS)
  • Oxide thin-film epitaxy (ferroelectric, magnetic films)
  • Microwave and RF devices
  • Optical thin films and coatings
  • Spintronic and magnetic devices
  • Semiconductor research and sensors

 

🔷 Why Choose MgO

  • Excellent substrate for superconducting films (YBCO等)
  • Ideal lattice matching for oxide and nitride materials
  • Low dielectric loss for high-frequency devices
  • High thermal and chemical stability for harsh environments
  • Wide optical transparency range for photonic applications

 

🔷 Customization Options

We support customized MgO wafers based on your requirements:

  • Size and thickness
  • Orientation (<100>, <110>, <111>)
  • Surface polishing (SSP / DSP)
  • Epitaxial-grade substrates
  • Research-grade substrates