Dummy Grade Silicon Wafer
Cost-effective silicon wafer for process testing, equipment calibration, and non-critical applications
Description
🔷 Product Overview
Dummy grade silicon wafers are high-purity single-crystal silicon substrates used for non-critical applications such as equipment testing, process calibration, and handling verification.
Unlike prime grade wafers, dummy wafers do not have strict requirements on electrical properties such as resistivity, dopant type, or crystal orientation, making them a cost-effective alternative for routine process use.
🔷 Key Specifications
| Product: | Monocrystalline Silicon |
| Grade: |
Dummy grade Dummy wafers and prime wafers are both of 11N purity with epi-polished surfaces. The difference between them is that dummy wafers do not have strict requirements on orientation and resistivity, and thus are cheap and suitable for certain applications. |
| Purity: | 99.999999999% (11N) |
| Dimension: |
Standard dimensions: • 2” × 0.28 mm, 2” × 0.4 mm • 4” × 0.525 mm • 6” × 0.625 mm • 8” × 0.725 mm Other diameters and thicknesses available |
| Orientation: | No requirements (can be any direction) |
| Conductive type: | No requirements (can be any type) |
| Resistivity: | No requirements (can be any resistivity) |
| Polishing: |
• As-cut wafers without polishing • Single side epi-polished • Double side epi-polished |
| Surface roughness: | < 0.5 nm |
| Remarks: | Dummy wafers have the same surface polishing conditions as prime wafers. |
🔷 Difference from Other Grade
| Feature | Prime Grade | Test Grade | Dummy Grade |
|---|---|---|---|
| Electrical control | High | Medium | None |
| Surface quality | Best | Good | Basic |
| Application | Device fabrication | Process development | Equipment testing |
🔷 Applications
- Equipment calibration and qualification
- Process testing and trial runs
- Wafer handling and training
- Furnace loading (dummy runs)
- Cleaning and coating process verification
👉 Widely used in semiconductor fabs and research labs.
🔷 Customization Available
- Diameter & thickness
- Polishing condition
- Surface coating (SiO₂, Si₃N₄, etc.)
- Special requirements upon request
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