Insulating Si3N4 layer coated on Si wafer by LPCVD, single/double coatings available
| Product: | Si wafer with Si3N4 (silicon nitride) layer |
| Production method: | Low pressure chemical vapor deposition (LPCVD) |
| Si base wafer: | Si3N4 layer can be deposited on Si wafer of any grade (prime / dummy / solar / etc) |
| SiO2 coating: | • Si3N4 layer coated on double sides The deposition method (LPCVD) naturally deposit Si3N4 layer on both sides. • Si3N4 layer coated on single side Si3N4 layer on back side (usually non-polished side) can be removed upon request. |
| Oxide layer thickness: | Usually several hundreds of nanometer |
| Polishing: | • As-cut wafers without polishing • Single side epi-polished • Double side epi-polished |
